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Thermo Fisher Introduces Thermo Scientific Centrios HX Circuit Edit System to Quickly Resolve Preproduction Design Flaws

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Thermo Fisher Scientific Inc., launches Thermo Scientific Centros HX Circuit Edit System, a state-of-the-art circuit edit solution that allows semiconductor manufacturers to optimize success rates with high resolution imaging and precise editing of today’s leading-edge devices.

 

The modern day semiconductor devices that is becoming more complex, need higher precision circuit edit tools to optimize product functionality and deliver prototypes to keep projects on track. The new system comes with new Ceita FIB column which offers next level of improved resolution, beam current and landing energy for intricate circuit modification without adversely affecting circuit performance or integrity. This helps semiconductor manufacturers to achieve faster time-to-market, while minimizing mask related development costs.

 

“With each semiconductor advancement, FIB circuit editing continues to grow in strategic importance as our customers design innovative technologies and bring them to market,” said Mohan Iyer, vice president and general manager of semiconductor at Thermo Fisher. “Next-generation logic devices, with buried power rails effectively blocking access to the active circuit area, will introduce new challenges. Engineered to support our customers in addressing the semiconductor industry’s evolving circuit edit requirements, the Centrios HX enables the ability to open windows in blocking metals for advanced editing and fault localization.”

 

The Centrios HX is designed to deliver precision and performance while maintaining device integrity and functionality. The new system enables engineers to:

 

  • Resolve fine features during circuit editing with up to 2.5 nanometer resolution at 250 femtoamperes (fA) with 30 kilovolts (kV).
  • Obtain highly consistent deposition and etching with the Thermo Scientific MultiChem Gas Delivery System.
  • Create open windows without circuit damage with operation at 5 kV.
  • Perform complicated edits with a patterning engine that offers a high degree of scan control.

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