SkyWater Technology (NASDAQ: SKYT) has announced a major advancement in semiconductor production with the acquisition of Multibeam Corp.’s first-of-its-kind Multicolumn E-Beam Lithography (MEBL) system. This landmark Multibeam (MB) platform introduces a high-throughput direct write patterning system that significantly outpaces conventional e-beam tools, promising rapid and efficient volume production.
The MEBL system, designed for early concept prototyping and swift production, brings a host of new capabilities to SkyWater’s customers. These include secure chip identification for anti-counterfeit applications, full wafer patterning for focal plane read-out ICs, and other large format die. Additionally, the system’s large depth of focus supports high topology microfluidic and MEMS architectures, curvilinear designs for photonics, and high-density MOS. Notably, it is the only production lithography tool capable of achieving sub-50 nm geometries on 200 mm wafers.
The MB platform’s unique configuration, featuring multiple miniaturized electron beam columns, transforms E-Beam Lithography (EBL) into a groundbreaking maskless lithography production system. This innovation offers substantial performance and cost advantages for integrated circuit fabs. The system’s development, a result of a two-year collaboration with SkyWater, involved critical fab operational insights to define key performance specifications.
Dr. David K. Lam, Chairman and CEO of Multibeam, expressed pride in this milestone achievement. “This is a significant milestone for Multibeam, and we are immensely proud to share it with SkyWater. Their support has been crucial in re-innovating EBL for high-volume production, helping us accelerate our development and commercialize a world-class maskless lithography system.”
Thomas Sonderman, SkyWater CEO and Director, highlighted the technology’s impact across various growth markets. “We are excited to offer new lithography capabilities to our customers, enabled by Multibeam’s revolutionary technology. The deployment of the MB platform will enhance capabilities and reduce time to market for innovators in secure defense, biomedical, thermal imaging, high reliability, and advanced compute markets.”
Sonderman further emphasized the significance of this partnership. “Our engagement with Multibeam exemplifies the power of partnerships in developing breakthrough equipment to accelerate chip innovation in the U.S., positioning SkyWater’s Minnesota fab with the most advanced 200 mm lithography in the world.”
SkyWater will make the MB platform available for initial customer designs in the fourth quarter of 2024, marking a significant step forward in the semiconductor industry.
